Optical Emission Spectroscopy is the most advanced instrument for plasma analysis.
Developing plasma monitoring products we analyze each possible case to create powerful solutions with ultimate capabilities. Our expertise serves for your need in the field of monitor and control plasma processes.
Advanced process monitoring & control with ultimate response rate analyze, calculate and keep stable process parameters. Intellectual software components will recognize different process conditions during the process and help to define process events, such as end-point detection or predefined conditions.
Smart Diagrams offer a way to visually conceptualize the control of plasma processes. It helps easily create and understand complex behavior of feedback loops.
Fast built-in database with thousands of species. Fast database search helps to define spectral lines for thousands of unique elements. Advanced search defines all spectral lines by easily adjustable criteria.